Invention Grant
- Patent Title: Solid-state image capturing element, manufacturing method therefor, and electronic device
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Application No.: US15995203Application Date: 2018-06-01
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Publication No.: US10536659B2Publication Date: 2020-01-14
- Inventor: Itaru Oshiyama , Hirotsugu Takahashi
- Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Current Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Current Assignee Address: JP Kanagawa
- Agency: Chip Law Group
- Priority: JP2013-247107 20131129
- Main IPC: H04N5/3745
- IPC: H04N5/3745 ; H01L31/0224 ; H01L27/146 ; H04N5/374 ; H01L31/032 ; H01L31/0328

Abstract:
The present disclosure relates to a solid-state image capturing element, a manufacturing method therefor, and an electronic device, which are capable of controlling a thickness of a depletion layer. The solid-state image capturing element includes pixels each in which a photoelectric conversion film configured to perform photoelectric conversion on incident light and a fixed charge film configured to have a predetermined fixed charge are stacked on a semiconductor substrate. The technology of the present disclosure can be applied to, for example, back surface irradiation type solid-state image capturing elements, image capturing devices such as digital still cameras or video cameras, mobile terminal devices having an image capturing function, and electronic devices using a solid-state image capturing element as an image capturing unit.
Public/Granted literature
- US20180288352A1 SOLID-STATE IMAGE CAPTURING ELEMENT, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC DEVICE Public/Granted day:2018-10-04
Information query
IPC分类: