- 专利标题: Composition for forming dense siliceous film
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申请号: US16096116申请日: 2017-04-28
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公开(公告)号: US10563093B2公开(公告)日: 2020-02-18
- 发明人: Yoshio Nojima , Masakazu Kobayashi
- 申请人: AZ Electronic Materials (Luxembourg) S.a.r.l.
- 申请人地址: LU Luxembourg
- 专利权人: AZ Electronic Materials (Luxembourg) S.a.r.l.
- 当前专利权人: AZ Electronic Materials (Luxembourg) S.a.r.l.
- 当前专利权人地址: LU Luxembourg
- 代理机构: Drinker Biddle & Reath LLP
- 优先权: JP2016-092672 20160502
- 国际申请: PCT/EP2017/060190 WO 20170428
- 国际公布: WO2017/191049 WO 20171109
- 主分类号: C08F2/48
- IPC分类号: C08F2/48 ; C08J7/18 ; C09D183/16 ; C08G77/62 ; C08L83/16 ; H01L21/02
摘要:
[Object] To provide a polysilazane-containing composition for forming a film. In order to form a dense and processable siliceous film, the composition is intended to be employed in a two-step conversion process comprising the steps of: forming a film having a dry surface from the composition provided that the conversion in to the siliceous substance proceeds insufficiently; and then subjecting the film to secondary processing. [Means] The present invention provides a polysilazane-containing film-forming composition comprising a particular amine compound, a polysilazane compound, and a solvent; and the invention also provides a process for forming a siliceous substance. In the process, the composition is applied to coat a substrate and thereafter converted into the siliceous substance. The particular amine compound has two amine groups, and the amine groups have at least one phenyl-substituted hydrocarbon group.
公开/授权文献
- US20190136088A1 COMPOSITION FOR FORMING DENSE SILICEOUS FILM 公开/授权日:2019-05-09
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