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公开(公告)号：US11269255B2
公开(公告)日：2022-03-08
申请号：US16832357
申请日：2020-03-27
发明人： Yuki Hirayama , Tadashi Kishimoto , Masayoshi Suzuki , Daishi Yokoyama , Katsuto Taniguchi , Toshiaki Nonaka
IPC分类号： G03F7/105 , G03F7/00 , G03F7/004 , G03F7/033 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/40 , B82Y20/00 , G02F1/1335 , F21V8/00 , G02F1/13357
摘要： The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
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公开(公告)号：US20210208503A1
公开(公告)日：2021-07-08
申请号：US15999429
申请日：2017-01-20
摘要： To provide a negative type photosensitive composition curable at a low temperature and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability, and also to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: an alkali-soluble resin, a compound having two or more (meth)acryloyloxy groups, a polysiloxane, a polymerization initiator, and a solvent. The alkali-soluble resin is a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit.
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公开(公告)号：US10509319B2
公开(公告)日：2019-12-17
申请号：US15553594
申请日：2016-02-05
发明人： Masayoshi Suzuki , Tadashi Kishimoto , Yuki Hirayama , Stephan Dertinger , Toshiaki Nonaka , Daishi Yokoyama
IPC分类号： G03F7/004 , G03F7/075 , C09K11/02 , C09K11/08 , C09K11/06 , G02B5/22 , G03F7/00 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/32
摘要： The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.
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公开(公告)号：US09817312B2
公开(公告)日：2017-11-14
申请号：US15031668
申请日：2014-10-14
发明人： Naofumi Yoshida , Yuji Tashiro
IPC分类号： G03F7/075 , G03F7/40 , G03F7/38 , G03F7/30 , G03F7/16 , G03F7/20 , G03F7/32 , C09D183/14 , C08L83/14 , C08G77/52
CPC分类号： G03F7/0757 , C08G77/52 , C08L83/14 , C09D183/14 , G03F7/162 , G03F7/20 , G03F7/30 , G03F7/322 , G03F7/38 , G03F7/40
摘要： A heat- or photo-curable composition comprising: a polysiloxane which is produced by reacting a silicon compound (i) represented by the formula: R1nSi(X)4-n (wherein R1 represents an alkyl group, an aryl group or the like; X represents a chlorine atom or an alkoxy group; and n represents 0 to 2) with a silicon compound (ii) represented by the formula (b) or (c) (wherein R2 to R7 independently represent an alkyl group or the like; M1 and M2 independently represent an arylene group, an alkylene group or the like; and Y1 to Y6 independently represent a chlorine atom or an alkoxy group) in the presence of an alkali catalyst or an acid catalyst; a polymerization initiator which enables the generation of an acid or a base by the action of heat or light; and a solvent. The composition enables the formation of a thick film. When the composition is coated onto a substrate, is then heated or exposed to light, is then developed if necessary, and is then heated and cured at a low temperature, a cured film can be formed.
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公开(公告)号：US20170219927A1
公开(公告)日：2017-08-03
申请号：US15519044
申请日：2015-10-13
发明人： Kazuma YAMAMOTO , Tatsuro NAGAHARA
IPC分类号： G03F7/42 , G03F7/16 , G03F7/039 , H01L21/027 , G03F7/20 , G03F7/38 , G03F7/32 , G03F7/40 , G03F7/038
CPC分类号： G03F7/425 , C11D11/0047 , G03F7/038 , G03F7/039 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/322 , G03F7/38 , G03F7/40 , G03F7/426 , H01L21/0206 , H01L21/027 , H01L21/0274
摘要： [Problem]To provide a composition capable of improving surface roughness of resist patterns, and also to provide a pattern formation method employing the composition.[Solution]The present invention provides a composition containing a particular nitrogen-containing compound, an anionic surfactant having a sulfo group, and water; and also provides a pattern formation method containing a step of applying the composition to a resist pattern beforehand developed and dried.
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公开(公告)号：US20170218227A1
公开(公告)日：2017-08-03
申请号：US15500427
申请日：2015-07-29
发明人： Shigemasa NAKASUGI , Takafumi KINUTA , Go NOYA , Hiroshi YANAGITA , Yusuke HAMA
IPC分类号： C09D179/02 , H01L21/768
CPC分类号： C09D179/02 , C08G69/26 , C08G73/0206 , C08G73/0233 , C08G73/026 , H01L21/3105 , H01L21/31058 , H01L21/31116 , H01L21/76802 , H01L21/76826 , H01L21/76879 , H01L2924/0002 , H01L2924/00
摘要： [Problem]To provide such a composition for producing a sacrifice layer as has excellent properties in both heat resistance and storage stability, and also to provide a process for producing a semiconductor device using the composition.[Solution]Disclosed is a composition for producing a sacrifice layer. The composition comprises a solvent and a polymer having a repeating unit containing a nitrogen atom with a lone pair, and contains particular transition metals only in a very low content. Also disclosed is a process using the composition as a sacrificial material for producing a semiconductor device comprising a porous material.
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公开(公告)号：US20170210896A1
公开(公告)日：2017-07-27
申请号：US15313670
申请日：2015-05-26
发明人： Shigemasa NAKASUGI , Takafumi KINUTA , Go NOYA
IPC分类号： C08L65/02 , H01L21/768 , H01L23/532 , C08G61/12
摘要： [Problem] To provide a composition for gap formation capable of forming sacrifice areas made of a sacrificial material decomposable completely into vapor at a desired temperature, and also to provide a semiconductor device-manufacturing method using the composition.[Solution] Disclosed is a composition for gap formation comprising a polymer and a solvent:wherein said polymer comprising five or more of repeating units which are represented by at least one kind of the following formula (1) or (2): Ar1-L1 (1) Ar2-L2-Ar2′ (2) [each of Ar1, Ar2 and Ar2′ is independently a substituted or unsubstituted aromatic group; and each of L1 and L2 is independently oxygen, sulfur, alkyl, sulfone, amide, ketone or a group represented by the following formula (3): {Ar3 is an aromatic group; and L3 is a trivalent atom selected from the group consisting of nitrogen, boron and phosphorus}].
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公开(公告)号：US20170174931A1
公开(公告)日：2017-06-22
申请号：US14975969
申请日：2015-12-21
发明人： Guanyang Lin , Hengpeng Wu , JiHoon Kim , Jian Yin , Durairaj Baskaran , Jianhui Shan
IPC分类号： C09D151/00 , B05D3/02 , H01L21/02 , H01L21/324 , H01L21/027
CPC分类号： C09D151/003 , B05D3/02 , C09D133/08 , C09D135/06 , H01L21/02118 , H01L21/0271 , H01L21/324
摘要： The present invention relates to non aqueous, graftable coating composition comprised of a homogenous solution of a polymer and a spin casting organic solvent, where the composition does not contain acidic compounds, coloring particles, pigments or dyes, and the polymer has a linear polymer chain structure which is comprised of repeat units derived from monomers containing a single polymerizable olefinic carbon double bond, and the polymer contains at least one triarylmethyl chalcogenide containing moiety which is selected from the group consisting of repeat units having structure (I) an end chain group unit of structure (II) and mixtures thereof, and the polymer does not contain any repeat units or end groups containing water ionizable groups, ionic groups, free thiol groups, or free hydroxy groups, and where A1, A2, and A3 are independently an Aryl or a substituted Aryl; Y is a chalcogen selected from O, S, Se or Te; X1 and X2 are individually selected organic spacers; P1 is an organic polymer repeat unit moiety derived from a monomer containing a single polymerizable olefinic carbon double bound, and P2 is an end group moiety derived from a monomer containing a single polymerizable olefinic carbon double bound, and represents a direct valence bond to the linear polymer. The invention also relates to using this novel coating composition to form a grafted polymer film on a substrate.
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9.发明申请公开(公告)号：US20170173562A1
公开(公告)日：2017-06-22
申请号：US14978462
申请日：2015-12-22
发明人： Ayrat Dimiev , Pui Lam Chiu
CPC分类号： B01J20/3085 , B01J20/22 , C01B32/05 , C01B32/30 , C01P2002/85 , C01P2002/88 , C01P2004/03 , C01P2006/12 , C01P2006/14 , C01P2006/16 , C02F1/283 , C02F2101/006 , C02F2101/10 , C02F2101/20 , C02F2103/023
摘要： The present invention relates to materials comprising a functionalized porous carbon, methods of forming a functionalized porous carbon, and methods of treating fluids with a functionalized porous carbon.
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公开(公告)号：US09676946B2
公开(公告)日：2017-06-13
申请号：US14899317
申请日：2014-07-01
IPC分类号： C09D5/16 , C09D183/08 , C09D7/12 , C09D183/16 , C08G77/62 , C08G77/16
CPC分类号： C09D5/1675 , C08G77/16 , C08G77/62 , C09D5/08 , C09D5/16 , C09D7/40 , C09D7/65 , C09D183/16 , C08L83/00
摘要： [Problem] To provide a coating composition, which can reduce a load to the environment and form a cured layer having corrosion resistance, antifouling property and high transparency.[Means for Solution] A coating composition comprising (A) a polysilazane having alkoxy-modified silane group in a side chain, (B) non-reactive polydialkylsiloxane and (C) reactive polydialkylsiloxane, and a obtained cured layer therewith.
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