Invention Grant
- Patent Title: Method for measuring a height map of multiple fields of view and combining them to a composite height map with minimized sensitivity to instrument drift
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Application No.: US15198261Application Date: 2016-06-30
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Publication No.: US10563974B2Publication Date: 2020-02-18
- Inventor: Johannes Anna Quaedackers , Adriaan Tiemen Zuiderweg
- Applicant: MITUTOYO CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: MITUTOYO CORPORATION
- Current Assignee: MITUTOYO CORPORATION
- Current Assignee Address: JP Kanagawa
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: EP15181597 20150819
- Main IPC: G01B11/06
- IPC: G01B11/06

Abstract:
A method for measuring a height map of multiple fields of view on a surface of a substrate with an optical profilometer and combining them to a composite height map, the method includes: moving the profilometer relative to the surface from field to field along a route; measuring height maps of fields on the surface along the route with the profilometer; and, combining a plurality of height maps of measured fields by normalizing said height maps to each other to produce a composite height map of the surface; wherein the route is configured to minimize sensitivity to height drifting of the profilometer during combining a plurality of the height maps.
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