- 专利标题: Bipolar semiconductor device and manufacturing method
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申请号: US12512285申请日: 2009-07-30
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公开(公告)号: US10566462B2公开(公告)日: 2020-02-18
- 发明人: Hans-Joachim Schulze , Frank Pfirsch , Franz-Josef Niedernostheide
- 申请人: Hans-Joachim Schulze , Frank Pfirsch , Franz-Josef Niedernostheide
- 申请人地址: AT Villach
- 专利权人: Infineon Technologies Austria AG
- 当前专利权人: Infineon Technologies Austria AG
- 当前专利权人地址: AT Villach
- 代理机构: Dicke, Billig & Czaja, PLLC
- 主分类号: H01L29/861
- IPC分类号: H01L29/861
摘要:
A bipolar semiconductor device and method are provided. One embodiment provides a bipolar semiconductor device including a first semiconductor region of a first conductivity type having a first doping concentration, a second semiconductor region of a second conductivity type forming a pn-junction with the first semiconductor region, and a plurality of third semiconductor regions of the first conductivity type at least partially arranged in the first semiconductor region and having a doping concentration which is higher than the first doping concentration. Each of the third semiconductor regions is provided with at least one respective junction termination structure.
公开/授权文献
- US20110024791A1 BIPOLAR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD 公开/授权日:2011-02-03
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