Invention Grant
- Patent Title: Integrated circuit including standard cells overlapping each other and method of generating layout of the integrated circuit
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Application No.: US15933958Application Date: 2018-03-23
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Publication No.: US10579771B2Publication Date: 2020-03-03
- Inventor: Jung-ho Do , Jong-hoon Jung , Ji-su Yu , Seung-young Lee , Tae-joong Song , Jae-boong Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0075016 20170614; KR10-2017-0121869 20170921
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L27/02 ; H01L27/118

Abstract:
Provided is an integrated circuit including a plurality of standard cells each including a front-end-of-line (FEOL) region and a back-end-of-line (BEOL) region on the FEOL region, the FEOL region including at least one gate line extending in a first horizontal direction. A BEOL region of a first standard cell among the plurality of standard cells includes an eaves section not overlapping an FEOL region of the first standard cell in a vertical direction, the eaves section protruding in a second horizontal direction perpendicular to the first horizontal direction.
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