- 专利标题: Integrated circuit including standard cells overlapping each other and method of generating layout of the integrated circuit
-
申请号: US15933958申请日: 2018-03-23
-
公开(公告)号: US10579771B2公开(公告)日: 2020-03-03
- 发明人: Jung-ho Do , Jong-hoon Jung , Ji-su Yu , Seung-young Lee , Tae-joong Song , Jae-boong Lee
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2017-0075016 20170614; KR10-2017-0121869 20170921
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; H01L27/02 ; H01L27/118
摘要:
Provided is an integrated circuit including a plurality of standard cells each including a front-end-of-line (FEOL) region and a back-end-of-line (BEOL) region on the FEOL region, the FEOL region including at least one gate line extending in a first horizontal direction. A BEOL region of a first standard cell among the plurality of standard cells includes an eaves section not overlapping an FEOL region of the first standard cell in a vertical direction, the eaves section protruding in a second horizontal direction perpendicular to the first horizontal direction.
公开/授权文献
信息查询