- 专利标题： Beam delivery apparatus and method
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申请号： US14917623申请日： 2014-09-24
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公开(公告)号： US10580545B2公开(公告)日： 2020-03-03
- 发明人: Vadim Yevgenyevich Banine , Petrus Rutgerus Bartraij , Ramon Pascal Van Gorkom , Lucas Johannes Peter Ament , Pieter Willem Herman De Jager , Gosse Charles De Vries , Rilpho Ludovicus Donker , Wouter Joep Engelen , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Erik Roelof Loopstra , Han-Kwang Nienhuys , Andrey Alexandrovich Nikipelov , Michael Jozef Mathijs Renkens , Franciscus Johannes Joseph Janssen , Borgert Kruizinga
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权： EP13199009 20131220; EP14151497 20140116; EP14152443 20140124; EP14155980 20140220; EP14165675 20140423; EP14171050 20140604; EP14171051 20140604; EP14172951 20140618; EP14173446 20140623
- 国际申请： PCT/EP2014/070335 WO 20140924
- 国际公布： WO2015/044182 WO 20150402
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G21K1/06
摘要：
A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
公开/授权文献
- US20160225477A1 BEAM DELIVERY APPARATUS AND METHOD 公开/授权日：2016-08-04
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