Invention Grant
- Patent Title: Exposure system alignment and calibration method
-
Application No.: US15686815Application Date: 2017-08-25
-
Publication No.: US10585360B2Publication Date: 2020-03-10
- Inventor: Tamer Coskun , Qin Zhong
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00

Abstract:
Methods are provided that, in some embodiments that provide alignment of a first layer of a printing plate on a chuck. For example, in one embodiment, images of reference marks on a chuck are captured to determine the initial positions of the reference marks on the chuck. A reference model is created from those initial positions. Images of alignment marks on a reference plate are captured and the locations of the alignment marks are determined. A reference plate model is created from the positions of the alignment marks. A mapping model is then created from the reference model and the reference plate model.
Public/Granted literature
- US20190064683A1 EXPOSURE SYSTEM ALIGNMENT AND CALIBRATION METHOD Public/Granted day:2019-02-28
Information query
IPC分类: