Invention Grant
- Patent Title: Hierarchical trim management for self-aligned double patterning
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Application No.: US15838520Application Date: 2017-12-12
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Publication No.: US10586009B2Publication Date: 2020-03-10
- Inventor: Laura R. Darden , David Wolpert
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Margaret McNamara
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Embodiments of the invention are directed to methods, systems, and computer program products for the hierarchical management of self-aligned double patterning (SADP) trim shapes. Non-limiting embodiments of the invention include receiving, by a processor, one or more virtual trim shapes at a boundary between a parent hierarchy block and a child hierarchy block. The trim shapes are aligned to a legal trim grid. The processor then places one or more trim shapes aligned with the legal trim grid.
Public/Granted literature
- US20190179994A1 HIERARCHICAL TRIM MANAGEMENT FOR SELF-ALIGNED DOUBLE PATTERNING Public/Granted day:2019-06-13
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