Invention Grant
- Patent Title: Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
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Application No.: US16050161Application Date: 2018-07-31
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Publication No.: US10591825B2Publication Date: 2020-03-17
- Inventor: Stephan Andre , Daniel Golde , Toralf Gruner , Johannes Ruoff , Norbert Wabra , Ricarda Schoemer , Sonja Schneider
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102014218474 20140915
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.
Public/Granted literature
- US20180364583A1 Projection Lens, Projection Exposure Apparatus and Projection Exposure Method for EUV Microlithography Public/Granted day:2018-12-20
Information query
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