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公开(公告)号：US10591825B2
公开(公告)日：2020-03-17
申请号：US16050161
申请日：2018-07-31
Applicant: Carl Zeiss SMT GmbH
Inventor： Stephan Andre , Daniel Golde , Toralf Gruner , Johannes Ruoff , Norbert Wabra , Ricarda Schoemer , Sonja Schneider
IPC: G03F7/20
Abstract: A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.
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公开(公告)号：US10303063B2
公开(公告)日：2019-05-28
申请号：US15827586
申请日：2017-11-30
Applicant: Carl Zeiss SMT GmbH
Inventor： Boris Bittner , Norbert Wabra , Martin von Hodenberg
IPC: G03F7/20
Abstract: A projection exposure apparatus for microlithography includes a projection lens which includes a plurality of optical elements for imaging mask structures onto a substrate during an exposure process. The projection exposure apparatus also includes at least one manipulator configured to change, as part of a manipulator actuation, the optical effects of at least one of the optical elements within the projection lens by changing a state variable of the optical element along a predetermined travel. The projection exposure apparatus further includes an algorithm generator configured to generate a travel generating optimization algorithm, adapted to at least one predetermined imaging parameter, on the basis of the at least one predetermined imaging parameter.
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公开(公告)号：US20160282729A1
公开(公告)日：2016-09-29
申请号：US15008519
申请日：2016-01-28
Applicant: Carl Zeiss SMT GmbH
Inventor： Norbert Wabra , Robert Eder
IPC: G03F7/20
CPC classification number: G03F7/706 , G02B27/0025 , G03F7/7015 , G03F7/70191 , G03F7/70225 , G03F7/70241 , G03F7/70308 , G03F7/70591 , G03F7/70975
Abstract: A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>−2 successive sections A1 to AN of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j=1 . . . N and a second optical element is arranged in another section Ak, k=1 . . . N, the magnitude difference |k−j| being an odd number.
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公开(公告)号：US20160054662A1
公开(公告)日：2016-02-25
申请号：US14837142
申请日：2015-08-27
Applicant: Carl Zeiss SMT GmbH
Inventor： Alexander Wolf , Toralf Gruner , Boris Bittner , Norbert Wabra
IPC: G03F7/20
CPC classification number: G03F7/706 , G03F7/70266 , G03F7/70308 , G03F7/70891
Abstract: The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator for reducing image aberrations, wherein the manipulator has at least two optical elements that can be positioned relative to one another, wherein at least one of the optical elements is spatially dependent in terms of its effect on an optical wavefront passing therethrough such that a local phase change of a wavefront propagating in the optical system is produced in the case of a relative movement of the optical elements against one another. Here, the spatially dependent effect of the at least one optical element can be set in a reversible dynamic manner.
Abstract translation: 本发明涉及一种用于半导体光刻的投影曝光装置，包括至少一个用于减少图像像差的操纵器，其中所述操纵器具有至少两个可相对于彼此定位的光学元件，其中至少一个所述光学元件在空间上 这取决于其对光波前通过的影响，使得在光学元件彼此相对运动的情况下产生在光学系统中传播的波阵面的局部相位变化。 这里，可以以可逆的动态方式设置至少一个光学元件的空间依赖的效果。
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公开(公告)号：US20140239192A1
公开(公告)日：2014-08-28
申请号：US14272982
申请日：2014-05-08
Applicant: Carl Zeiss SMT GmbH
Inventor： Sonja Schneider , Norbert Wabra , Martin von Hodenberg , Boris Bittner , Ricarda Schneider
IPC: G03F7/20
CPC classification number: G03F7/2002 , G03F7/70191 , G03F7/70558
Abstract: An illumination and displacement device for a projection exposure apparatus comprises an illumination optical unit for illuminating an illumination field. An object holder serves for mounting an object in such a way that at least one part of the object can be arranged in the illumination field. An object holder drive serves for displacing the object during illumination in an object displacement direction. A correction device serves for the spatially resolved influencing of an intensity of the illumination at least of sections of the illumination field, wherein there is a spatial resolution of the influencing of the intensity of the illumination of the illumination field at least along the object displacement direction. This results in an illumination and displacement device in which field-dependent imaging aberrations which are present during the projection exposure do not undesirably affect a projection result.
Abstract translation: 用于投影曝光装置的照明和位移装置包括用于照明照明场的照明光学单元。 物体保持器用于安装物体，使得物体的至少一部分可以布置在照明场中。 物体保持器驱动器用于在物体移动方向的照明期间使物体移动。 校正装置用于空间分辨影响至少照明场部分的照明强度，其中至少沿物体位移方向存在对照明场照明强度的影响的空间分辨率 。 这导致照明和位移装置，其中在投影曝光期间存在的场依赖的成像像差不会不期望地影响投影结果。
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Patent Agency Ranking
公开(公告)号：US11415894B2
公开(公告)日：2022-08-16
申请号：US17380231
申请日：2021-07-20
Applicant: Carl Zeiss SMT GmbH
Inventor： Judith Fingerhuth , Norbert Wabra , Sonja Schneider , Ferdinand Djuric-Rissner , Peter Graf , Reimar Finken
IPC: G03F7/20
Abstract: A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.
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7.发明授权公开(公告)号：US10401540B2
公开(公告)日：2019-09-03
申请号：US15405012
申请日：2017-01-12
Applicant: Carl Zeiss SMT GmbH
Inventor： Boris Bittner , Norbert Wabra , Holger Schmidt , Ricarda Schoemer , Sonja Schneider
Abstract: The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λEUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.
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公开(公告)号：US10261425B2
公开(公告)日：2019-04-16
申请号：US14837142
申请日：2015-08-27
Applicant: Carl Zeiss SMT GmbH
Inventor： Alexander Wolf , Toralf Gruner , Boris Bittner , Norbert Wabra
Abstract: The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator for reducing image aberrations, wherein the manipulator has at least two optical elements that can be positioned relative to one another, wherein at least one of the optical elements is spatially dependent in terms of its effect on an optical wavefront passing therethrough such that a local phase change of a wavefront propagating in the optical system is produced in the case of a relative movement of the optical elements against one another. Here, the spatially dependent effect of the at least one optical element can be set in a reversible dynamic manner.
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9.发明申请公开(公告)号：US20180364583A1
公开(公告)日：2018-12-20
申请号：US16050161
申请日：2018-07-31
Applicant: Carl Zeiss SMT GmbH
Inventor： Stephan Andre , Daniel Golde , Toralf Gruner , Johannes Ruoff , Norbert Wabra , Ricarda Schoemer , Sonja Schneider
IPC: G03F7/20
Abstract: A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.
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公开(公告)号：US10061206B2
公开(公告)日：2018-08-28
申请号：US15814765
申请日：2017-11-16
Applicant: Carl Zeiss SMT GmbH
Inventor： Boris Bittner , Norbert Wabra , Sonja Schneider , Ricarda Schoemer
CPC classification number: G03F7/70266 , G02B13/143 , G02B27/0068 , G03F7/70258 , G03F7/70308
Abstract: A projection lens images a pattern of a mask arranged in the region of an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation with a work wavelength λ
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