- 专利标题: Electronic device and method for fabricating the same
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申请号: US16107338申请日: 2018-08-21
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公开(公告)号: US10593878B2公开(公告)日: 2020-03-17
- 发明人: Kyoung Su Choi
- 申请人: SK hynix Inc.
- 申请人地址: KR Icheon
- 专利权人: SK hynix Inc.
- 当前专利权人: SK hynix Inc.
- 当前专利权人地址: KR Icheon
- 优先权: KR10-2017-0169415 20171211
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/16 ; H01L45/00 ; G11C7/18 ; G11C8/14 ; H01L27/24 ; H01L27/22
摘要:
An electronic device includes a semiconductor memory, wherein the semiconductor memory comprises a plurality of memory stacks neighboring each other in a first direction and a second direction, the second direction intersecting the first direction, a plurality of first liner layers covering sidewalls of memory stacks that neighbor each other in the second direction, the plurality of first liner layers extending in the second direction, a plurality of first air gaps located in spaces covered by the first liner layers, and a plurality of second air gaps located between each pair of memory stacks that neighbor each other in the first direction, the plurality of second air gaps extending in the second direction.
公开/授权文献
- US20190181341A1 ELECTRONIC DEVICE AND METHOD FOR FABRICATING THE SAME 公开/授权日:2019-06-13
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