Invention Grant
- Patent Title: Antimony-containing materials for ion implantation
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Application No.: US16106197Application Date: 2018-08-21
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Publication No.: US10597773B2Publication Date: 2020-03-24
- Inventor: Aaron Reinicker , Ashwini K Sinha , Douglas C Heiderman
- Applicant: Aaron Reinicker , Ashwini K Sinha , Douglas C Heiderman
- Applicant Address: US CT Danbury
- Assignee: Praxair Technology, Inc.
- Current Assignee: Praxair Technology, Inc.
- Current Assignee Address: US CT Danbury
- Agent Nilay S. Dalal
- Main IPC: C23C14/48
- IPC: C23C14/48 ; H01J37/08 ; H01J37/317 ; C23C14/14 ; H01J37/32 ; H01L21/265

Abstract:
A novel method, composition and system for using antimony-containing dopant materials are provided. The composition is selected with sufficient vapor pressure to flow into an arc chamber as part of an ion implant process. The antimony-containing material is represented by a non-carbon containing chemical formula, thereby reducing or eliminating the introduction of carbon-based deposits into the ion chamber. The composition is stored in a storage and delivery vessel under stable conditions, which includes a moisture-free environment that does not contain trace amounts of moisture.
Public/Granted literature
- US20190062901A1 ANTIMONY-CONTAINING MATERIALS FOR ION IMPLANTATION Public/Granted day:2019-02-28
Information query
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