Invention Grant
- Patent Title: Nuisance reduction using location-based attributes
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Application No.: US15858511Application Date: 2017-12-29
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Publication No.: US10600177B2Publication Date: 2020-03-24
- Inventor: Bjorn Brauer , Junqing Huang , Lisheng Gao
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06T7/73

Abstract:
Methods and systems are disclosed that provide nuisance reduction in images, such as semiconductor images that include one or more metal lines. A potential defect is correlated against pixel grey level intensity charts for two perpendicular axes. A position of the potential defect relative to a pattern, such as a metal line, is determined along the two axes. The potential defect can be classified as a defect of interest or nuisance event.
Public/Granted literature
- US20190050974A1 Nuisance Reduction Using Location-Based Attributes Public/Granted day:2019-02-14
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