Invention Grant
- Patent Title: Finger metal-on-metal capacitor containing negative capacitance material
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Application No.: US15961594Application Date: 2018-04-24
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Publication No.: US10600569B2Publication Date: 2020-03-24
- Inventor: Ye Lu , Haitao Cheng , Chao Song
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Holland & Hart LLP/Qualcomm
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01G4/10 ; H01L23/522 ; H01G4/01

Abstract:
Methods, systems, and devices for a finger metal-on-metal (FMOM) capacitor including a negative capacitance material are described. In one examples, a FMOM capacitor may include a first electrode and a second electrode. The FMOM capacitor may include a dielectric layer coating a first sidewall of the first electrode and a second sidewall of a second electrode. A portion of the first sidewall may be substantially parallel to a portion of the second sidewall. The FMOM capacitor may also include a negative capacitance material disposed in a channel between the first sidewall of the first electrode and the second sidewall of the second electrode. The negative capacitance material may extend in a direction that is substantially parallel to the portion of the first sidewall and the portion of the second sidewall.
Public/Granted literature
- US20190326057A1 FINGER METAL-ON-METAL CAPACITOR CONTAINING NEGATIVE CAPACITANCE MATERIAL Public/Granted day:2019-10-24
Information query
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