Invention Grant
- Patent Title: Charged particle beam apparatus
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Application No.: US15936140Application Date: 2018-03-26
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Publication No.: US10600612B2Publication Date: 2020-03-24
- Inventor: Toshiyuki Iwahori
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2017-060905 20170327
- Main IPC: H01J37/09
- IPC: H01J37/09 ; H01J37/08 ; H01J37/20 ; H01J37/26

Abstract:
A charged particle beam apparatus includes a sample chamber; a sample stage; an electron beam column irradiating a sample S using an electron beam; and a focused ion beam column irradiating the sample S using a focused ion beam. The apparatus includes an electrode member displaceable between an insertion position between a beam emitting end portion of the electron beam column and the sample stage and a withdrawal position distant from the insertion position, the electrode member being provided with an electrode penetrating hole passing the electron beam therethrough. The apparatus includes a driving unit displacing the electrode member; a power source applying a negative voltage to the electrode member; and an insulation member electrically insulating the sample chamber the driving unit from the electrode member.
Public/Granted literature
- US20180277333A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2018-09-27
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