Invention Grant
- Patent Title: Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus
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Application No.: US16271303Application Date: 2019-02-08
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Publication No.: US10649346B2Publication Date: 2020-05-12
- Inventor: Takeshi Kaneko , Joost Jeroen Ottens , Raymond Wilhelmus Louis Lafarre
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20
Abstract:
A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.
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