Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
-
Application No.: US16219449Application Date: 2018-12-13
-
Publication No.: US10649347B2Publication Date: 2020-05-12
- Inventor: Michael Johannes Christiaan Ronde , Lucas Kuindersma , Niels Johannes Maria Bosch , Hans Butler , Cornelius Adrianus Lambertus De Hoon , Marc Wilhelmus Maria Van Der Wijst , Thijs Verhees , Sander Kerssemakers
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; H01J37/26

Abstract:
An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.
Public/Granted literature
- US20190129317A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2019-05-02
Information query