公开(公告)号：US12007699B2

公开(公告)日：2024-06-11

申请号：US17787235

申请日：2020-11-13

Applicant: ASML Netherlands B.V.

Inventor： Sander Kerssemakers ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Henricus Gerardus Tegenbosch

IPC: G03F7/20 ,  G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70841 ,  G03F7/70033 ,  G03F7/70975 ,  H05G2/005 ,  H05G2/008

Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.

公开(公告)号：US10409175B2

公开(公告)日：2019-09-10

申请号：US15027986

申请日：2014-10-22

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Marc Wilhelmus Maria Van Der Wijst ,  Thijs Verhees ,  Sander Kerssemakers

IPC: G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.

公开(公告)号：US10088756B2

公开(公告)日：2018-10-02

申请号：US15321184

申请日：2015-06-04

Applicant: ASML Netherlands B.V.

Inventor： Sander Kerssemakers ,  Wilhelmus Petrus De Boeij ,  Gerben Frank De Lange ,  Christiaan Alexander Hoogendam ,  Petrus Franciscus Van Gils ,  Jelmer Mattheüs Kamminga ,  Jan Jaap Kuit ,  Carolus Johannes Catharina Schoormans

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.

公开(公告)号：US10649347B2

公开(公告)日：2020-05-12

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael Johannes Christiaan Ronde ,  Lucas Kuindersma ,  Niels Johannes Maria Bosch ,  Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Marc Wilhelmus Maria Van Der Wijst ,  Thijs Verhees ,  Sander Kerssemakers

IPC: G03B27/42 ,  G03F7/20 ,  H01J37/26

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

公开(公告)号：US10139735B2

公开(公告)日：2018-11-27

申请号：US15316036

申请日：2015-05-13

Applicant: ASML Netherlands B.V.

Inventor： Johannes Jacobus Matheus Baselmans ,  Hans Butler ,  Christiaan Alexander Hoogendam ,  Sander Kerssemakers ,  Bart Smeets ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Hubertus Petrus Leonardus Henrica Van Bussel

IPC: G02B27/52 ,  G03F7/20

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

公开(公告)号：US10114299B2

公开(公告)日：2018-10-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Mark Constant Johannes Baggen ,  Gerard Johannes Boogaard ,  Nicolaas Rudolf Kemper ,  Sander Kerssemakers ,  Robertus Mathijs Gerardus Rijs ,  Frank Johannes Jacobus Van Boxtel ,  Erwin Antonius Henricus Franciscus Van Den Boogaert ,  Marc Wilhelmus Maria Van Der Wijst ,  Martinus Van Duijnhoven ,  Jessica Henrica Anna Verdonschot ,  Hendrikus Herman Marie Cox

IPC: G10K11/168 ,  G03F7/20 ,  G10K11/16

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.