Invention Grant
- Patent Title: Method of examining locations in a wafer with adjustable navigation accuracy and system thereof
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Application No.: US16227453Application Date: 2018-12-20
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Publication No.: US10663407B2Publication Date: 2020-05-26
- Inventor: Idan Kaizerman , Mark Geshel
- Applicant: Applied Materials Israel Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel Ltd.
- Current Assignee: Applied Materials Israel Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Lowenstein Sandler LLP
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G06F30/398 ; G01N21/95

Abstract:
Data indicative of alignment targets may be received. Each alignment target may be associated with a target location on an object. Locations of the object to be inspected may be identified. An alignment target from the alignment targets may be selected. Each of the locations may be within a determined distance from the selected alignment target. An indication may be provided to align the object relative to an examination tool for inspecting the locations within the determined distance from the selected alignment target.
Public/Granted literature
- US20190234887A1 METHOD OF EXAMINING LOCATIONS IN A WAFER WITH ADJUSTABLE NAVIGATION ACCURACY AND SYSTEM THEREOF Public/Granted day:2019-08-01
Information query
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