Invention Grant
- Patent Title: Memory device with discharge voltage pulse to reduce injection type of program disturb
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Application No.: US16377421Application Date: 2019-04-08
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Publication No.: US10665306B1Publication Date: 2020-05-26
- Inventor: Hong-Yan Chen , Henry Chin
- Applicant: SanDisk Technologies LLC
- Applicant Address: US TX Addison
- Assignee: SanDisk Technologies LLC
- Current Assignee: SanDisk Technologies LLC
- Current Assignee Address: US TX Addison
- Agency: Vierra Magen Marcus LLP
- Main IPC: G11C16/34
- IPC: G11C16/34 ; G11C16/24 ; G11C16/08 ; G11C7/10 ; G11C16/26 ; G11C7/04 ; G11C16/16

Abstract:
Techniques are disclosed for reducing an injection type of program disturb in a memory device. In one aspect, a discharge operation is performed at the start of a program loop. This operation discharges residue electrons from the channel region on the source side of the selected word line, WLn, to the channel region on the drain side of WLn. As a result, in a subsequent channel pre-charge operation, the residue electrons can be more easily removed from the channel. The discharge operation involves applying a voltage pulse to WLn and a first set of drain-side word lines which is adjacent to WLn. The remaining unselected word lines may be held at ground during the voltage pulse.
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