Invention Grant
- Patent Title: Systems and methods for pedestal configuration
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Application No.: US16049037Application Date: 2018-07-30
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Publication No.: US10672642B2Publication Date: 2020-06-02
- Inventor: Paneendra Prakash Bhat , Mehmet Samir , Nikolai Kalnin
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L21/687
- IPC: H01L21/687 ; G01C9/02 ; H01L21/67 ; H01J37/32
Abstract:
Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.
Public/Granted literature
- US20200035540A1 SYSTEMS AND METHODS FOR PEDESTAL CONFIGURATION Public/Granted day:2020-01-30
Information query
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