Invention Grant
- Patent Title: Integrated circuit substrate and method for manufacturing the same
-
Application No.: US16029934Application Date: 2018-07-09
-
Publication No.: US10672716B2Publication Date: 2020-06-02
- Inventor: Michael Roesner , Gudrun Stranzl , Manfred Engelhardt , Martin Zgaga
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L21/78 ; H01L21/3065

Abstract:
An integrated circuit substrate and a method for manufacturing the same are disclosed. In an embodiment a method includes providing a wafer having a plurality of active areas, each active area being provided in a separate die area and for each active area, providing a code pattern outside the active area, the code pattern being associated with the die area.
Public/Granted literature
- US20180315713A1 Integrated Circuit Substrate and Method for Manufacturing the Same Public/Granted day:2018-11-01
Information query
IPC分类: