A method for manufacturing a stepped spacer wafer for a wafer-level camera includes a step of measuring a plurality of focal lengths f1,2, . . . , N of a respective one of a plurality of lenses L1,2, . . . , N of a lens wafer. The method also includes a step of fabricating a stepped spacer wafer including (i) a plurality of apertures A1,2, . . . , N therethrough, and (ii) a plurality of thicknesses T1,2, . . . , N defining a respective thickness of the stepped spacer wafer at least partially surrounding a respective one of the plurality of apertures A1,2, . . . , N. Each of the plurality of thicknesses T1,2, . . . , N is equal to a difference between (a) a respective one of the plurality of focal lengths f1,2, . . . , N, and (b) a uniform thickness that is the same for each of the plurality of thicknesses.