Invention Grant
- Patent Title: Projection system modelling method
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Application No.: US16307372Application Date: 2017-05-15
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Publication No.: US10678143B2Publication Date: 2020-06-09
- Inventor: Giovanni Imponente , Pierluigi Frisco
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@129487c2
- International Application: PCT/EP2017/061565 WO 20170515
- International Announcement: WO2017/211538 WO 20171214
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20

Abstract:
A projection system model is configured to predict optical aberrations of a projection system based upon a set of projection system characteristics and to determine and output a set of optical element adjustments based upon a merit function. The merit function comprises a set of parameters and corresponding weights. The method comprises receiving an initial merit function and executing an optimization algorithm to determine a second merit function. The optimization algorithm scores different merit functions based upon projection system characteristics of a projection system adjusted according to the output of the projection system model using a merit function having that set of parameters and weights.
Public/Granted literature
- US20190227441A1 Projection System Modelling Method Public/Granted day:2019-07-25
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