公开(公告)号：US11022895B2

公开(公告)日：2021-06-01

申请号：US16644135

申请日：2018-08-14

Applicant: ASML Netherlands B.V.

Inventor： Pierluigi Frisco ,  Giovanni Imponente ,  James Robert Downes

IPC: G03B27/54 ,  G03F7/20

Abstract: A method comprising determining aberrations caused by each lithographic apparatus of a set of lithographic apparatuses, calculating adjustments of the lithographic apparatuses which minimize differences between the aberrations caused by each of the lithographic apparatuses, and applying the adjustments to the lithographic apparatuses, providing better matching between the aberrations of patterns projected by the lithographic apparatuses.

公开(公告)号：US10678143B2

公开(公告)日：2020-06-09

申请号：US16307372

申请日：2017-05-15

Applicant: ASML Netherlands B.V.

Inventor： Giovanni Imponente ,  Pierluigi Frisco

IPC: G03B27/68 ,  G03F7/20

Abstract: A projection system model is configured to predict optical aberrations of a projection system based upon a set of projection system characteristics and to determine and output a set of optical element adjustments based upon a merit function. The merit function comprises a set of parameters and corresponding weights. The method comprises receiving an initial merit function and executing an optimization algorithm to determine a second merit function. The optimization algorithm scores different merit functions based upon projection system characteristics of a projection system adjusted according to the output of the projection system model using a merit function having that set of parameters and weights.