Invention Grant
- Patent Title: Pattern structure for preventing visibility of moiré and display apparatus using the pattern structure
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Application No.: US16134471Application Date: 2018-09-18
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Publication No.: US10678359B2Publication Date: 2020-06-09
- Inventor: Eunhyoung Cho , Bonwon Koo , Hyunjoon Kim , Haesung Kim , Jungyun Won
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@753729de
- Main IPC: G06F3/041
- IPC: G06F3/041 ; H01L27/32 ; G06K9/00 ; G06F3/044

Abstract:
Provided are a pattern structure for preventing a moiré pattern from becoming visible, and a display apparatus using the same. The pattern structure includes a first element pattern including a plurality of first elements arranged regularly at a first pitch; a second element pattern including a plurality of second elements arranged regularly at a second pitch, the second element pattern being provided on the first element pattern; and a filling layer configured to fill gaps among the plurality of second elements, between adjacent ones thereof. A difference between transmittances of the second element and the filling layer is about 5% or less and thus, a moiré pattern occurring due to the overlapping of the first element pattern and the second element pattern may be prevented from becoming visible.
Public/Granted literature
- US20190087044A1 PATTERN STRUCTURE FOR PREVENTING VISIBILITY OF MOIRÉ AND DISPLAY APPARATUS USING THE PATTERN STRUCTURE Public/Granted day:2019-03-21
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