Systems enabling lower-stress processing of semiconductor device structures and related structures
Abstract:
Semiconductor device assemblies may include a carrier wafer and a thermoset adhesive on a surface of the carrier wafer. A metal barrier material may be located on the thermoset adhesive. A thermoplastic adhesive may be located on an opposite side of the metal barrier material from the thermoset adhesive. A device wafer may be located on an opposite side of the thermoplastic material from the metal barrier material. Semiconductor device processing systems may include a carrier wafer having a thermoset adhesive adhered to a surface thereof and a metal barrier material adhered to the thermoset adhesive opposite the carrier wafer. A laser apparatus may be located on an opposite side of the carrier wafer from the metal barrier material and positioned to aim a laser beam through the carrier wafer to impinge on the metal barrier material.
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