Invention Grant
- Patent Title: Extreme ultraviolet lithography system having chuck assembly and method of manufacturing thereof
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Application No.: US15031677Application Date: 2014-12-19
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Publication No.: US10691013B2Publication Date: 2020-06-23
- Inventor: Majeed A. Foad
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- International Application: PCT/US2014/071698 WO 20141219
- International Announcement: WO2015/095808 WO 20150625
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/22 ; H01L21/683 ; G03F1/60
Abstract:
An EUV lithography system and method of manufacturing thereof includes: an EUV light source; a chuck being thermally conducting and smooth having a surface with a predetermined chuck flatness; and a reflective lens system for directing EUV light from the EUV light source over the surface of the chuck.
Public/Granted literature
- US20160342096A1 EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM HAVING CHUCK ASSEMBLY AND METHOD OF MANUFACTURING THEREOF Public/Granted day:2016-11-24
Information query
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