- 专利标题: Care areas for improved electron beam defect detection
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申请号: US15639311申请日: 2017-06-30
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公开(公告)号: US10692690B2公开(公告)日: 2020-06-23
- 发明人: Vidyasagar Anantha , Arpit Yati , Saravanan Paramasivam , Martin Plihal , Jincheng Lin
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Hodgson Russ LLP
- 主分类号: H01J37/00
- IPC分类号: H01J37/00 ; H01J37/244 ; H01J37/28 ; H01J37/20
摘要:
Use of care areas in scanning electron microscopes or other review tools can provide improved sensitivity and throughput. A care area is received at a controller of a scanning electron microscope from, for example, an inspector tool. The inspector tool may be a broad band plasma tool. The care area is applied to a field of view of a scanning electron microscope image to identify at least one area of interest. Defects are detected only within the area of interest using the scanning electron microscope. The care areas can be design-based or some other type of care area. Use of care areas in SEM tools can provide improved sensitivity and throughput.
公开/授权文献
- US20180277337A1 Care Areas for Improved Electron Beam Defect Detection 公开/授权日:2018-09-27
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