- Patent Title: Leakage current reduction in electrical isolation gate structures
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Application No.: US16156461Application Date: 2018-10-10
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Publication No.: US10700065B2Publication Date: 2020-06-30
- Inventor: Emre Alptekin , Thomas Hoffmann
- Applicant: Apple Inc.
- Applicant Address: US CA Cupertino
- Assignee: Apple Inc.
- Current Assignee: Apple Inc.
- Current Assignee Address: US CA Cupertino
- Agency: Kowert, Hood, Munyon, Rankin & Goetzel, P.C.
- Agent Lawrence J. Merkel
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L27/02 ; G06F30/398

Abstract:
In an embodiment, an integrated circuit includes transistors in different active regions, electrically isolated using single diffusion break isolation. The single diffusion break isolation includes a first dummy transistor that has a different threshold voltage than the transistors in either active region for which the single diffusion break is creating isolation. The first dummy transistor may have lower leakage current than transistors in either active region, creating effective isolation between the active regions and consuming relatively small amounts of power due to the lower leakage currents.
Public/Granted literature
- US20200118999A1 Leakage Current Reduction in Electrical Isolation Gate Structures Public/Granted day:2020-04-16
Information query
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