- 专利标题: Memory device and a method for forming the memory device
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申请号: US16264745申请日: 2019-02-01
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公开(公告)号: US10700277B1公开(公告)日: 2020-06-30
- 发明人: Lanxiang Wang , Shyue Seng Tan , Eng Huat Toh
- 申请人: GLOBALFOUNDRIES Singapore Pte. Ltd.
- 申请人地址: SG Singapore
- 专利权人: GLOBALFOUNDRIES Singapore Pte. Ltd.
- 当前专利权人: GLOBALFOUNDRIES Singapore Pte. Ltd.
- 当前专利权人地址: SG Singapore
- 代理机构: Viering Jentschura & Partner MBB
- 代理商 Natalie A. Lee
- 主分类号: H01L27/24
- IPC分类号: H01L27/24 ; H01L45/00
摘要:
A memory device may include a bottom electrode, first and second switching elements over the bottom electrode, and first and second top electrodes over the first and second switching elements respectively. The first and second top electrodes may include first and second contact surfaces in contact with the first and second switching elements respectively. The first and second switching elements may each have a resistance configured to switch between resistance values in response to changes in voltages applied between the top electrodes and the bottom electrode. The bottom electrode may include at least one conductive layer having third and fourth contact surfaces in contact with the first and second switching elements respectively. An area of the first contact surface may be greater than an area of the third contact surface, and an area of the second contact surface may be greater than an area of the fourth contact surface.
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