发明授权
- 专利标题: Plasma generator
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申请号: US16465191申请日: 2017-11-21
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公开(公告)号: US10728997B2公开(公告)日: 2020-07-28
- 发明人: Takahiro Shiohara , Takeshi Kamono
- 申请人: TDK CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: TDK CORPORATION
- 当前专利权人: TDK CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@386ccbc7
- 国际申请: PCT/JP2017/041842 WO 20171121
- 国际公布: WO2018/101126 WO 20180607
- 主分类号: H05H1/24
- IPC分类号: H05H1/24 ; H01L31/107 ; H02M7/48 ; H01L41/107
摘要:
A plasma generator capable of adjusting the amount of plasma generation in a simple configuration includes a control circuit controlling a frequency of an AC power supplied to a piezoelectric transformer and a control signal generation circuit providing a control signal to the control circuit. The plasma generator is configured so that the control signal output from the control signal generation circuit is appropriately adjusted. The control circuit controls the frequency of the AC power so as to bring a target value, which is set based on the control signal provided from the control signal generation circuit.
公开/授权文献
- US20200053862A1 PLASMA GENERATOR 公开/授权日:2020-02-13
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