- Patent Title: Emission quantification using a line scan of gas concentration data
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Application No.: US15385233Application Date: 2016-12-20
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Publication No.: US10732014B2Publication Date: 2020-08-04
- Inventor: Sean Patrick MacMullin , Chris W. Rella
- Applicant: Picarro, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Picarro, Inc.
- Current Assignee: Picarro, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lumen Patent Firm
- Main IPC: G01M3/04
- IPC: G01M3/04 ; G01F1/00 ; G01M3/38
Abstract:
Flux estimates for gas plumes from gas leaks are obtained from a 1-D horizontal line scan of gas concentration measurements, combined with an estimate of the vertical extent of the gas plume. In this manner, flux estimates for gas plumes can be obtained without having to gather a 2-D image of gas concentration data.
Public/Granted literature
- US20180172544A1 Emission quantification using a line scan of gas concentration data Public/Granted day:2018-06-21
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