- Patent Title: 3D SRAM circuit with double gate transistors with improved layout
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Application No.: US16379476Application Date: 2019-04-09
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Publication No.: US10741565B2Publication Date: 2020-08-11
- Inventor: Francois Andrieu , Remy Berthelon , Bastien Giraud
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES , STMicroelectronics (Crolles 2) SAS
- Applicant Address: FR Paris FR Crolles
- Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES,STMicroelectronics (Crolles 2) SAS
- Current Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES,STMicroelectronics (Crolles 2) SAS
- Current Assignee Address: FR Paris FR Crolles
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@97c43f7
- Main IPC: G11C11/41
- IPC: G11C11/41 ; H01L27/11 ; G11C11/419 ; H01L21/822 ; H01L27/06 ; H01L27/12

Abstract:
The application relates to an integrated circuit with SRAM memory and provided with several superimposed levels of transistors, the integrated circuit including SRAM cells provided with a first transistor and a second transistor belonging to an upper level of transistors and each having a double gate composed of an upper electrode and a lower electrode laid out on either side of a semiconductor layer, a lower gate electrode of the first transistor being connected to a lower gate electrode of the second transistor.
Public/Granted literature
- US20190312039A1 3D SRAM CIRCUIT WITH DOUBLE GATE TRANSISTORS WITH IMPROVED LAYOUT Public/Granted day:2019-10-10
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