Invention Grant
- Patent Title: Method and apparatus for inspecting process solution, and sample preparation apparatus in inspection
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Application No.: US14475164Application Date: 2014-09-02
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Publication No.: US10746635B2Publication Date: 2020-08-18
- Inventor: Tzu-Sou Chuang , Chi-Wen Kuo
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: G01N1/28
- IPC: G01N1/28 ; G01Q60/24 ; G01N27/02 ; G01N27/72 ; G01Q60/38 ; G01Q60/46 ; G01Q60/50 ; G01Q60/26 ; G01Q60/30 ; G01N21/65 ; G01B5/00 ; G01N21/84

Abstract:
A method for inspecting a process solution is provided. In this method, a process solution is disposed on a surface of a substrate. A liquid of the process solution is removed to form an inspection sample by a spinning method. The surface of the substrate of the inspection sample is inspected by the surface inspection device to identify whether a residue of the process solution is left on the surface of the substrate after removing the liquid of the process solution. Further, an apparatus for inspecting a process solution and a sample preparation apparatus in inspection are also provided herein.
Public/Granted literature
- US20160061695A1 METHOD AND APPARATUS FOR INSPECTING PROCESS SOLUTION, AND SAMPLE PREPARATION APPARATUS IN INSPECTION Public/Granted day:2016-03-03
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