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Invention Grant
US10747101B2 Photomask, laminate comprising photomask, photomask preparation method, and pattern forming method using photomask 有权

  • Patent Title: Photomask, laminate comprising photomask, photomask preparation method, and pattern forming method using photomask
  • Application No.: US15580241
    Application Date: 2016-07-28
  • Publication No.: US10747101B2
    Publication Date: 2020-08-18
  • Inventor: Yong Goo Son , Kiseok Lee , Seung Heon Lee
  • Applicant: LG CHEM, LTD.
  • Applicant Address: KR Seoul
  • Assignee: LG CHEM, LTD.
  • Current Assignee: LG CHEM, LTD.
  • Current Assignee Address: KR Seoul
  • Agency: Dentons US LLP
  • Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@432acd01
  • International Application: PCT/KR2016/008299 WO 20160728
  • International Announcement: WO2017/018831 WO 20170202
  • Main IPC: G03F1/48
  • IPC: G03F1/48 ;  G03F1/38
Photomask, laminate comprising photomask, photomask preparation method, and pattern forming method using photomask
Abstract:
The present specification relates to a photomask, a laminate including the photomask, a method for manufacturing the photomask and a method for forming a pattern using the photomask.
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