Invention Grant
- Patent Title: Droplet generator for lithographic apparatus, EUV source and lithographic apparatus
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Application No.: US15781885Application Date: 2016-11-22
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Publication No.: US10750604B2Publication Date: 2020-08-18
- Inventor: Johan Frederik Dijksman , Wilhelmus Henricus Theodorus Maria Aangenent , Ronald Johannes Hultermans , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Peter Wilhelm Hendrik Van Putten
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@69210397
- International Application: PCT/EP2016/078427 WO 20161122
- International Announcement: WO2017/102261 WO 20170622
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.
Public/Granted literature
- US20180368241A1 DROPLET GENERATOR FOR LITHOGRAPHIC APPARATUS, EUV SOURCE AND LITHOGRAPHIC APPARATUS Public/Granted day:2018-12-20
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