Invention Grant
- Patent Title: Method and device for pupil illumination in overlay and critical dimension sensors
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Application No.: US16313816Application Date: 2017-06-16
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Publication No.: US10754259B2Publication Date: 2020-08-25
- Inventor: Yevgeniy Konstantinovich Shmarev , Markus Franciscus Antonius Eurlings
- Applicant: ASML Holding N.V. , ASML Netherlands B.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2017/064734 WO 20170616
- International Announcement: WO2018/001751 WO 20180104
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/956 ; G01N21/47 ; G02B26/08 ; G02B27/28 ; G02B5/00

Abstract:
An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.
Public/Granted literature
- US20190155172A1 Method and Device for Pupil Illumination in Overlay and Critical Dimension Sensors Public/Granted day:2019-05-23
Information query
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