Invention Grant
- Patent Title: Methods of alignment marking semiconductor wafers, and semiconductor packages having portions of alignment markings
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Application No.: US16554118Application Date: 2019-08-28
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Publication No.: US10756022B2Publication Date: 2020-08-25
- Inventor: Richard T. Housley , Jianming Zhou
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/544 ; H01L21/78

Abstract:
Some embodiments include a semiconductor package. The semiconductor package has a semiconductor die with a primary region which includes integrated circuitry, and with an edge region which includes a portion of an alignment mark location. The portion of the alignment mark location includes a segment of an alignment mark. The alignment mark includes a pattern of lines and spaces, with the lines extending along a first direction. The portion of the alignment mark location also includes a texture having a pattern other than lines extending along either the first direction or along a second direction substantially orthogonal to the first direction. Some embodiments include methods for alignment marking semiconductor wafers.
Public/Granted literature
Information query
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