Invention Grant
- Patent Title: Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
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Application No.: US15481405Application Date: 2017-04-06
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Publication No.: US10761438B2Publication Date: 2020-09-01
- Inventor: Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; B05C9/12
Abstract:
A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
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