- 专利标题: Flow passage structure and processing apparatus
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申请号: US15757382申请日: 2017-06-26
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公开(公告)号: US10774420B2公开(公告)日: 2020-09-15
- 发明人: Takahiro Terada , Shiguma Kato , Shinya Higashi , Masayuki Tanaka , Takuya Matsuda
- 申请人: Kabushiki Kaisha Toshiba
- 申请人地址: JP Minato-ku
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5c4e521d
- 国际申请: PCT/JP2017/023442 WO 20170626
- 国际公布: WO2018/047440 WO 20180315
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; H01L21/67
摘要:
According to an embodiment, a flow passage structure includes a member. The member has a surface and is provided with a first passage, a plurality of first openings, a second passage, and a plurality of second openings. The first passage includes a plurality of first closed path portions connected to each other. The first openings is connected to the first passage and is opened in the surface. The second passage includes a plurality of second closed path portions connected to each other. The second openings is connected to the second passage and is opened in the surface. The first closed path portions pass through the second closed path portions while being isolated from the second closed path portions. The second closed path portions pass through the first closed path portions while being isolated from the first closed path portions.
公开/授权文献
- US20200232095A1 FLOW PASSAGE STRUCTURE AND PROCESSING APPARATUS 公开/授权日:2020-07-23
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