An extreme ultraviolet (EUV) generation device includes a housing module including a housing body whose inside is maintained in a vacuum state and an exit window formed on one side of the housing body, a laser source which emits lasers toward the inside of the housing body through the exit window, a plasma generation module which is located inside the housing body and generates plasma by allowing the lasers to be emitted toward a plasma gas, which flows into a laser focal area, and a radio frequency (RF) power supply module which preionizes the plasma gas before the plasma gas flows into the laser focal area.