Invention Grant
- Patent Title: Semi-supervised anomaly detection in scanning electron microscope images
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Application No.: US16106341Application Date: 2018-08-21
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Publication No.: US10789703B2Publication Date: 2020-09-29
- Inventor: Shaoyu Lu , Li He , Sankar Venkataraman
- Applicant: KLA-TENCOR CORPORATION
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06N3/04

Abstract:
Autoencoder-based, semi-supervised approaches are used for anomaly detection. Defects on semiconductor wafers can be discovered using these approaches. The model can include a variational autoencoder, such as a one that includes ladder networks. Defect-free or clean images can be used to train the model that is later used to discover defects or other anomalies.
Public/Granted literature
- US20190287230A1 SEMI-SUPERVISED ANOMALY DETECTION IN SCANNING ELECTRON MICROSCOPE IMAGES Public/Granted day:2019-09-19
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