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公开(公告)号：US20230099105A1
公开(公告)日：2023-03-30
申请号：US18076375
申请日：2022-12-06
发明人： Yoel Feler , Vladimir Levinski , Roel Gronheid , Sharon Aharon , Evgeni Gurevich , Anna Golotsvan , Mark Ghinovker
摘要： Metrology methods and targets are provided for reducing or eliminating a difference between a device pattern position and a target pattern position while maintaining target printability, process compatibility and optical contrast—in both imaging and scatterometry metrology. Pattern placement discrepancies may be reduced by using sub-resolved assist features in the mask design which have a same periodicity (fine pitch) as the periodic structure and/or by calibrating the measurement results using PPE (pattern placement error) correction factors derived by applying learning procedures to specific calibration terms, in measurements and/or simulations. Metrology targets are disclosed with multiple periodic structures at the same layer (in addition to regular target structures), e.g., in one or two layers, which are used to calibrate and remove PPE, especially when related to asymmetric effects such as scanner aberrations, off-axis illumination and other error sources.
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公开(公告)号：US11441893B2
公开(公告)日：2022-09-13
申请号：US16018355
申请日：2018-06-26
发明人： Prasanna Dighe , Dieter Mueller , Dong Chen , Dengpeng Chen , Steve Zamek , Daniel Kavaldjiev , Alexander Buettner
摘要： A system for analyzing a sample includes an illumination source with a plurality of transmitting optical fibers optically coupled to the illumination source and a detector with a plurality of receiving optical fibers optically coupled to the detector. The system further includes a plurality of probes coupled to respective ones of the plurality of transmitting optical fibers and respective ones of the plurality of receiving optical fibers. The plurality of probes are configured to illuminate respective portions of a surface of the sample and configured to receive illumination reflected, refracted, or radiated from the respective portions of the surface of the sample. The system may further include one or more switches and/or splitters configured to optically couple respective ones of the plurality of transmitting optical fibers to the illumination source and/or configured to optically couple respective ones of the plurality of receiving optical fibers to the detector.
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公开(公告)号：US11430687B2
公开(公告)日：2022-08-30
申请号：US16340634
申请日：2019-03-25
发明人： Ariel Hildesheim , Ofer Angel
IPC分类号： B25B11/00 , H01L21/683 , H01L21/687
摘要： A vacuum hold-down apparatus retains a wafer in a desired position and orientation. A vacuum chuck assembly of the vacuum hold-down apparatus has a vacuum chuck surface with a vacuum communication aperture. A venturi vacuum generator is fixed with respect to the vacuum chuck assembly and communicates with the vacuum chuck surface via the vacuum communication aperture. A positive pressure fluid line communicates with the venturi vacuum generator.
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公开(公告)号：US11422095B2
公开(公告)日：2022-08-23
申请号：US16286315
申请日：2019-02-26
发明人： Phillip Atkins , Liequan Lee , Shankar Krishnan , David C. S. Wu , Emily Chiu
IPC分类号： G01N21/956 , G01N21/25 , G01N21/47 , G03F7/20 , G01N21/95
摘要： A metrology system may receive a model for measuring one or more selected attributes of a target including features distributed in a selected pattern based on regression of spectroscopic scatterometry data from a scatterometry tool for a range of wavelengths. The metrology system may further generate a weighting function for the model to de-emphasize portions of the spectroscopic scatterometry data associated with wavelengths at which light captured by the scatterometry tool when measuring the target is predicted to include undesired diffraction orders. The metrology system may further direct the spectroscopic scatterometry tool to generate scatterometry data of one or more measurement targets including fabricated features distributed in the selected pattern. The metrology system may further measure the selected attributes for the one or more measurement targets based on regression of the scatterometry data of the one or more measurement targets to the model weighted by the weighting function.
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5.发明授权公开(公告)号：US11380594B2
公开(公告)日：2022-07-05
申请号：US15903693
申请日：2018-02-23
发明人： Tianrong Zhan , Yin Xu , Liequan Lee
摘要： Machine learning techniques are used to predict values of fixed parameters when given reference values of critical parameters. For example, a neural network can be trained based on one or more critical parameters and a low-dimensional real-valued vector associated with a spectrum, such as a spectroscopic ellipsometry spectrum or a specular reflectance spectrum. Another neural network can map the low-dimensional real-valued vector. When using two neural networks, one neural network can be trained to map the spectra to the low-dimensional real-valued vector. Another neural network can be trained to predict the fixed parameter based on the critical parameters and the low-dimensional real-valued vector from the other neural network.
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公开(公告)号：US20220197152A1
公开(公告)日：2022-06-23
申请号：US17689934
申请日：2022-03-08
发明人： Vladimir Levinski , Amnon Manassen , Eran Amit , Nuriel Amir , Liran Yerushalmi , Amit Shaked
IPC分类号： G03F7/20
摘要： Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.
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7.发明授权公开(公告)号：US11333621B2
公开(公告)日：2022-05-17
申请号：US16030849
申请日：2018-07-09
发明人： Daniel Wack , Oleg Khodykin , Andrei V. Shchegrov , Alexander Kuznetsov , Nikolay Artemiev , Michael Friedmann
IPC分类号： G01N23/201 , G01N23/20008 , H01L21/67 , H01L21/66
摘要： Methods and systems for performing measurements of semiconductor structures based on high-brightness, polychromatic, reflective small angle x-ray scatterometry (RSAXS) metrology are presented herein. RSAXS measurements are performed over a range of wavelengths, angles of incidence, and azimuth angles with small illumination beam spot size, simultaneously or sequentially. In some embodiments, RSAXS measurements are performed with x-ray radiation in the soft x-ray (SXR) region at grazing angles of incidence in the range of 5-20 degrees. In some embodiments, the x-ray illumination source size is 10 micrometers or less, and focusing optics project the source area onto a wafer with a demagnification factor of 0.2 or less, enabling an incident x-ray illumination spot size of less than two micrometers. In another aspect, active focusing optics project programmed ranges of illumination wavelengths, angles of incidence, and azimuth angles, or any combination thereof, onto a metrology area, either simultaneously or sequentially.
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公开(公告)号：US11294161B2
公开(公告)日：2022-04-05
申请号：US17109480
申请日：2020-12-02
发明人： James Jianguo Xu , Ken Kinsun Lee , Rusmin Kudinar , Ronny Soetarman , Hung Phi Nguyen , Zhen Hou
摘要： A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
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公开(公告)号：US11270430B2
公开(公告)日：2022-03-08
申请号：US15971536
申请日：2018-05-04
发明人： Abdurrahman Sezginer , Xiaochun Li , Pavan Kumar , Junqing Huang , Lisheng Gao , Grace H. Chen , Yalin Xiong , Hawren Fang
IPC分类号： G06T7/00
摘要： Systems and methods increase the signal to noise ratio of optical inspection of wafers to obtain higher inspection sensitivity. The computed reference image can minimize a norm of the difference of the test image and the computed reference image. A difference image between the test image and a computed reference image is determined. The computed reference image includes a linear combination of a second set of images.
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公开(公告)号：US11262591B2
公开(公告)日：2022-03-01
申请号：US16186320
申请日：2018-11-09
发明人： Ilya Bezel , Matthew Derstine , Andrey Stepanov , Nikolay Sherbak
摘要： A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. In embodiments, the system includes an illumination source and a beam shaper. The illumination source can be configured to output illumination having a first pupil power distribution. In embodiments, the beam shaper is configured to receive the illumination having the first pupil power distribution from the illumination source and is further configured to output pump illumination having a second pupil power distribution that is different from the first pupil power distribution.
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