Invention Grant
- Patent Title: Apparatus, system, and method of providing a ramped interconnect for semiconductor fabrication
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Application No.: US16104716Application Date: 2018-08-17
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Publication No.: US10790172B2Publication Date: 2020-09-29
- Inventor: Lim Lai Ming , Zambri Bin Samsudin
- Applicant: Lim Lai Ming , Zambri Bin Samsudin
- Applicant Address: US FL St. Petersburg
- Assignee: JABIL INC.
- Current Assignee: JABIL INC.
- Current Assignee Address: US FL St. Petersburg
- Agency: Barnes & Thornburg LLP
- Agent Thomas J. McWilliams
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L21/67 ; C23C18/08

Abstract:
The disclosure is and includes at least an apparatus, system and method for a ramped electrical interconnection for use in semiconductor fabrications. The apparatus, system and method includes at least a first semiconductor substrate having thereon a first electrical circuit comprising first electrical components; a second semiconductor substrate at least partially covering the first electrical circuit, and having thereon a second electrical circuit comprising second electrical components; a ramp formed through the second semiconductor substrate between at least one of the first electrical components and at least one of the second electrical components; and an additively manufactured conductive trace formed on the ramp to electrically connect the at least one first electrical component and the at least one second electrical component.
Public/Granted literature
- US20200058527A1 APPARATUS, SYSTEM, AND METHOD OF PROVIDING A RAMPED INTERCONNECT FOR SEMICONDUCTOR FABRICATION Public/Granted day:2020-02-20
Information query
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