- Patent Title: Low profile embedded non-intrusive stress measurement system probe
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Application No.: US16132128Application Date: 2018-09-14
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Publication No.: US10794795B2Publication Date: 2020-10-06
- Inventor: Eli Cole Warren , Michael F. Sabol , Alan E. Ingram , Michael J. Saitta , Darren M. Wind , Steven D Mitchell , Sebastian Martinez , Kevin Andrew Ford , Patrick M. Harrington
- Applicant: UNITED TECHNOLOGIES CORPORATION
- Applicant Address: US CT Farmington
- Assignee: Raytheon Technologies Corporation
- Current Assignee: Raytheon Technologies Corporation
- Current Assignee Address: US CT Farmington
- Agency: Snell & Wilmer L.L.P.
- Main IPC: G01M15/14
- IPC: G01M15/14 ; F01D25/24 ; F02C3/04 ; F02C7/00 ; F02K3/06

Abstract:
A low profile un-lensed non-intrusive stress measurement system probe may comprise a housing comprising a first channel and an optical face, a first hypotube disposed within the first channel and coupled at a sensing aperture in the optical face, and a plurality of optical fibers disposed within the first hypotube, wherein the first hypotube executes a bend between 45° and 90° within the housing.
Public/Granted literature
- US20200088606A1 LOW PROFILE EMBEDDED NON-INTRUSIVE STRESS MEASUREMENT SYSTEM PROBE Public/Granted day:2020-03-19
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