Invention Grant
- Patent Title: Hydrogen supply system for adjusting dew point of a hydrogen-containing gas supplied thereto
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Application No.: US16198271Application Date: 2018-11-21
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Publication No.: US10811712B2Publication Date: 2020-10-20
- Inventor: Osamu Sakai , Kunihiro Ukai , Hidenobu Wakita
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@46f72fc4
- Main IPC: H01M8/06
- IPC: H01M8/06 ; H01M8/0662 ; C25B15/08 ; C25B9/10 ; C25B15/02 ; B01D53/22 ; B01D53/32 ; C01B3/50 ; H01M8/04119 ; H01M8/04082

Abstract:
A hydrogen supply system includes an electrochemical hydrogen pump which includes: an electrolyte membrane; an anode provided on a first surface of the electrolyte membrane; a cathode provided on a second surface of the electrolyte membrane opposite to the first surface; and a current adjuster adjusting a current amount flowing between the anode and the cathode, and which performs a hydrogen supply operation by allowing a current to flow between the anode and the cathode using the current adjuster so as to boost the pressure of hydrogen which is supplied to an anode side at a cathode side and to supply the pressure-boosted hydrogen to a hydrogen demander; and a dew point adjuster adjusting a dew point of a mixed gas in which a hydrogen-containing gas which is discharged from the anode side and a hydrogen-containing gas which is supplied from an outside are mixed together.
Public/Granted literature
- US20190173114A1 HYDROGEN SUPPLY SYSTEM Public/Granted day:2019-06-06
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