Invention Grant
- Patent Title: Cleaning system for a polishing film
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Application No.: US15980906Application Date: 2018-05-16
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Publication No.: US10814356B2Publication Date: 2020-10-27
- Inventor: Liming Xin , Yun Liu , Fengchun Xie , Dandan Zhang , Roberto Francisco-Yi Lu , Lei Zhou , Kok Wai Wong
- Applicant: Tyco Electronics (Shanghai) Co. Ltd. , TE Connectivity Corporation , Innogetic Technology Co., Ltd.
- Applicant Address: CN Shanghai US PA Berwyn CN Zhuhai
- Assignee: Tyco Electronics (Shanghai) Co. Ltd.,TE Connectivity Corporation,Innogetic Technology Co. Ltd.
- Current Assignee: Tyco Electronics (Shanghai) Co. Ltd.,TE Connectivity Corporation,Innogetic Technology Co. Ltd.
- Current Assignee Address: CN Shanghai US PA Berwyn CN Zhuhai
- Agency: Barley Snyder
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3c6f366d
- Main IPC: B08B1/00
- IPC: B08B1/00 ; B08B1/04 ; B08B3/02 ; B24B53/017 ; B24B53/02 ; B08B5/02

Abstract:
A cleaning system comprises a first cleaning tank, a carrying and moving unit, a first cleaning spray head, and a rolling brush unit. The carrying and moving unit is configured to move a polishing film to be cleaned into the first cleaning tank and hold the polishing film in the first cleaning tank. The first cleaning spray head is configured to spray a cleaning liquid on the polishing film held in the first cleaning tank. The rolling brush unit is configured to brush the polishing film while the first cleaning spray head sprays the cleaning liquid on the polishing film.
Public/Granted literature
- US20180257112A1 Cleaning System Public/Granted day:2018-09-13
Information query
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